Nikon 和 Synopsys 宣布推出适用于 45 nm 及以下的制造感知型 DFM 解决方案
Nikon 和 Synopsys 宣布推出适用于 45 nm 及以下的制造感知型 DFM 解决方案
2007 年 9 月 18 日
嵌入式扫描仪参数模块为共同客户提供了更高的 OPC 精度、增强的模型可预测性并缩短了硅片生产时间
2007 年 9 月 18 日，加利福尼亚州贝尔蒙特市和加利福尼亚州山景城市 – 微电子制造光刻设备的领先供应商尼康公司和半导体设计和制造软件的全球领导者 Synopsys， Inc.（纳斯达克股票代码：SNPS）今天宣布，尼康专有的光学光刻曝光工具数据可用于最新版本的 Synopsys Proteus 光学邻近校正 （OPC） 软件。作为持续合作的一部分，两家公司开发了嵌入式扫描仪参数模块，该模块可提供高级 45 纳米 （nm） 及以下 IC（集成电路）制造所需的“制造感知”OPC 和分辨率增强技术 （RET） 光刻仿真模型。共同客户可以从提高的 OPC 模型精度和缩短的硅片生产时间中受益。
在 45 nm 及以下，临界尺寸 （CD） 控制发生在单纳米级别，将当前的 OPC/RET 模型和光学光刻系统性能推向了极端极限。当前的 OPC 设计工具使用光刻工具的理想化模型来校正掩模图形的最佳邻近效应。只有通过迭代调整蒙版图案并将仿真模型与校准的曝光结果进行比较，才能优化蒙版图案。这种方法可能无法生成准确、可预测的模型，因此可能不适合高级技术节点的 OPC。
为了应对这一挑战，Nikon 和 Synopsys 去年开展了一项合作，目标是提供“制造感知”OPC 解决方案，为他们的共同客户提供更高的建模精度，从而降低高级节点的开发成本。新开发的界面允许 Proteus 建模客户自动访问尼康专有的扫描仪信息，包括以下尼康曝光系统（NSR-S610C、NSR-S609B 和 NSR-S308F）的高阶平版印刷效果，如偏振、眩光、同步和各种像差数据。由于使用这种方法创建的模型可以准确预测以前使用传统“理想化”OPC 模型所遗漏的平版印刷效果，因此这种新的集成显著提高了 OPC 建模精度并缩短了 OPC 建模时间。这项新功能可用于 Proteus 的最新生产版本。
“我们与 Synopsys 一起展示了使用精确扫描仪模型进行 OPC 开发的好处，”尼康公司精密设备公司执行官 Toshikazu Umatate 表示。“通过将我们专有的扫描仪信息整合到 Proteus 软件中，Nikon 客户可以获得竞争优势，提高 OPC 精度并缩短优化时间。”
“Proteus OPC 展示了重要的技术领先地位。它已经投入生产 10 年，连续 7 个技术节点，逐年实现了显著的软件性能改进。将 Nikon 的专有光刻信息与 Proteus 掩模合成数据相结合，将 OPC 精度提升到一个新的领域，从而改善了 45 纳米及以下的 CD 控制，“Synopsys 硅工程集团高级副总裁兼总经理 Wolfgang Fichtner 博士说。“这种合作将帮助我们的共同客户实现他们的模型生产和良率目标，从而降低他们的总体拥有成本。”
关于尼康
自 1980 年以来，尼康公司一直在通过创新产品和技术彻底改变光刻技术。该公司是微电子制造行业光刻设备的全球领导者，在全球安装了 7,800 多套曝光系统。Nikon 提供业内最广泛的生产级步进机和扫描仪选择。这些产品服务于半导体、平板显示器 （LCD） 和薄膜磁头 （TFH） 行业。Nikon Precision Inc. 在北美为 Nikon 光刻设备提供服务、培训、应用和技术支持，以及销售和营销。有关尼康的更多信息，请访问我们的网站 www.nikonprecision.com
关于 Synopsys DFMSynopsys
， Inc.（纳斯达克股票代码：SNPS）是半导体设计电子设计自动化 （EDA） 软件的全球领导者。凭借其面向制造的设计 （DFM） 工具，Synopsys 正在扩展已经从 RTL 到硅片的全面 DFM 解决方案。Synopsys 的 DFM 产品系列解决了以下产品的关键可制造性和良率问题：IC Compiler 物理设计解决方案、PrimeYield LCC、PrimeYield CMP、Hercules? PVS、Proteus OPC、CATS? 掩模数据准备产品、SiVL? 光刻验证工具、获得专利的 PSM 技术和软件、IC WorkBench 查看器和编辑器工具，以及基于物理的 TCAD 仿真产品套件。Synopsys 的制造良率管理 （MYM） 解决方案直接扩展到晶圆厂，为客户提供对良率数据的实时访问以及减少随机、系统和参数缺陷所需的分析能力。http://www.synopsys.com/ 访问 Synopsys 在线。
关于 Synopsys
Synopsys， Inc.（纳斯达克股票代码：SNPS）是半导体设计电子设计自动化 （EDA） 软件的全球领导者。该公司为全球电子市场提供技术领先的系统和半导体设计与验证平台、IC 制造和良率优化解决方案、半导体知识产权和设计服务。这些解决方案支持复杂集成电路和电子系统的开发和生产。通过其全面的解决方案，Synopsys 解决了设计人员和制造商当今面临的关键挑战，包括电源管理、加快良率和系统到硅验证。Synopsys 总部位于加利福尼亚州山景城，在北美、欧洲、日本和亚洲设有 60 多个办事处。http://www.synopsys.com/ 访问 Synopsys 在线。
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Synopsys、CATS 和 SiVL 是 Synopsys， Inc. 的注册商标。Hercules 是 Synopsys， Inc. 的商标。本新闻稿中提及的任何其他商标或注册商标均为其各自所有者的知识产权。
Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
September 18, 2007
Embedded Scanner Parameter Module Delivers Improved OPC Accuracy, Enhanced Model Predictability and Reduced Time to Silicon for Mutual Customers
Belmont, Calif. and Mountain View, Calif. – September 18, 2007 – Nikon Corporation, a leading supplier of lithography equipment for microelectronics manufacturing, and Synopsys, Inc. (Nasdaq: SNPS), a world leader in semiconductor design and manufacturing software, today announced that Nikon’s proprietary optical lithography exposure tool data is available for the latest release of the Synopsys Proteus optical proximity correction (OPC) software. As part of an ongoing collaboration, the two companies developed an embedded scanner parameter module, which delivers the “manufacturing-aware” OPC and resolution enhancement technology (RET) lithography simulation models needed for advanced 45-nanometer (nm) and below IC (integrated circuit) manufacturing. Mutual customers can benefit from improved OPC model accuracy and reduced time to silicon.
At 45 nm and below, critical dimension (CD) control takes place at the single nanometer level, pushing current OPC/RET models and optical-lithography system performance to extreme limits. Current OPC design tools use idealized models of lithography tools to correct for optimal proximity effects of the mask pattern. Only by iteratively adjusting the mask pattern and comparing the simulated model to the calibrated exposure results can the mask pattern be optimized. This approach may not produce accurate, predictable models and therefore may not be suitable for OPC at advanced technology nodes.
To address this challenge, Nikon and Synopsys undertook a collaboration last year with the goal of delivering a “manufacturing-aware” OPC solution that provides improved modeling accuracy for their mutual customers, thereby reducing the cost of development at advanced nodes. The newly developed interface allows Proteus modeling customers to automatically access Nikon’s proprietary scanner information, including such higher-order lithographic effects as polarization, flare, synchronization, and various aberration data for the following Nikon exposure systems: NSR-S610C, NSR-S609B, and NSR-S308F. Because models created with this methodology can accurately predict lithographic printing effects previously missed with traditional “idealized” OPC models, this new integration significantly increases OPC modeling accuracy and reduces OPC modeling time. This new functionality is available for the latest production release of Proteus.
“Together with Synopsys, we have shown the benefits of using an accurate scanner model for OPC development,” stated Toshikazu Umatate, executive officer, Precision Equipment Company, Nikon Corporation. “By incorporating our proprietary scanner information into the Proteus software, Nikon customers can gain a competitive advantage with improved OPC accuracy and faster optimization time.”
“Proteus OPC has demonstrated significant technology leadership. It’s been in production for 10 years and seven consecutive technology nodes, delivering significant software performance improvement year over year. Combining proprietary lithography information from Nikon with Proteus mask-synthesis data moves OPC accuracy into a new domain leading to improved CD control at 45 nanometers and below,” said Dr. Wolfgang Fichtner, senior VP and general manager, Silicon Engineering Group at Synopsys. “This collaboration will help our mutual customers achieve their model production and yield goals, thereby reducing their overall cost of ownership.”
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in lithography equipment for the microelectronics manufacturing industry with more than 7,800 exposure systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (LCD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography equipment in North America. For more information about Nikon, access our web site at www.nikonprecision.com
About Synopsys DFM
Synopsys, Inc. (NASDAQ: SNPS) is a world leader in electronic design automation (EDA) software for semiconductor design. With its design for manufacturing (DFM) tools, Synopsys is expanding on what is already a comprehensive DFM solution that spans from RTL to silicon. Synopsys’ DFM product family addresses critical manufacturability and yield issues with the following products: IC Compiler physical design solution, PrimeYield LCC, PrimeYield CMP, Hercules? PVS, Proteus OPC, CATS? mask data preparation product, SiVL? lithography verification tool, patented PSM technology and software, IC WorkBench Viewer and Editor tool, and physics-based TCAD suite of simulation products. Synopsys’ Manufacturing Yield Management (MYM) solutions extend directly into the fab, providing customers real-time access to yield data and the analysis capability needed to reduce random, systematic and parametric defects. Visit Synopsys online at http://www.synopsys.com/.
About Synopsys
Synopsys, Inc. (Nasdaq:SNPS) is a world leader in electronic design automation (EDA) software for semiconductor design. The company delivers technology-leading system and semiconductor design and verification platforms, IC manufacturing and yield optimization solutions, semiconductor intellectual property and design services to the global electronics market. These solutions enable the development and production of complex integrated circuits and electronic systems. Through its comprehensive solutions, Synopsys addresses the key challenges designers and manufacturers face today, including power management, accelerated time to yield and system-to-silicon verification. Synopsys is headquartered in Mountain View, California, and has more than 60 offices located throughout North America, Europe, Japan and Asia. Visit Synopsys online at http://www.synopsys.com/.
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Synopsys, CATS and SiVL are registered trademarks of Synopsys, Inc. Hercules is a trademark of Synopsys, Inc. Any other trademarks or registered trademarks mentioned in this release are the intellectual property of their respective owners.
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深圳市矢量科学仪器有限公司是集半导体仪器装备代理及技术服务的国家级高新技术企业。 致力于提供半导体前道制程工艺装备、后道封装装备、半导体分析测试设备、半导体光电测试仪表及相关仪器装备维护、保养、售后技术支持及实验室整体...